Vertically grown metal nanosheets integrated with atomic-layer-deposited dielectrics for transistors with subnanometre capacitance-equivalent thicknesses

Authors: Lei Zhang, Zhaochao Liu, Wei Ai, Jiabiao Chen, Zunxian Lv, Bing Wang, Mingjian Yang, Feng Luo, Jinxiong Wu

Published: 2024-07-08

DOI: 10.1038/s41928-024-01202-3

Source: Full article

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Abstract

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