Ultrasmooth and Photoresist‐Free Micropore‐Based EGaIn Molecular Junctions: Fabrication and How Roughness Determines Voltage Response

Authors: Senthil Kumar Karuppannan, Hu Hongting, Cedric Troadec, Ayelet Vilan, Christian A. Nijhuis

Published: 2019-07-23

DOI: 10.1002/adfm.201904452

Source: Full article


Abstract

AbstractIn molecular electronics, it is critical to minimize the sources that can result in defective electrodes, such as contaminations related to the fabrication process (photoresist and organic residues) or roughening of the electrode during etching, because these defects hamper the formation of well‐organized molecular structures. Junctions based on micropores are desirable as they are scalable, but micropores are not fabricated on ultrasmooth template‐stripped electrodes, and may suffer from stray capacitances and leakage currents across the insulating matrix. A method is reported to fabricate micropores in AlOx