Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask Approach

Authors: Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T. Shaw, Ross Lundy, Andrew Selkirk, Michael A. Morris

Published: 2021-05-27

DOI: 10.1021/acsnano.0c09232

Source: Full article

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Abstract

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