Authors: Hongbing Cai, Qiushi Meng, Qiang Chen, Huaiyi Ding, Yanmeng Dai, Sijia Li, Disheng Chen, Qinghai Tan, Nan Pan, Changgan Zeng, Zeming Qi, Gang Liu, Yangchao Tian, Weibo Gao, Xiaoping Wang
Published: 2020-07-27
Source: Full article
AbstractMetamaterials have gained much attention thanks to their extraordinary and intriguing optical properties beyond natural materials. However, universal high‐resolution fabrications of 3D micro/nanometastructures with high‐resolution remain a challenge. Here, a novel approach to fabricate sophisticated 3D micro/nanostructures with excellent robustness and precise controllability is demonstrated by simultaneously modulating of flexible resist stencils and basal molds. This method allows arbitrary manipulations of morphology, size, and orientation, as well as contact angles of the objects. Combined with a new alignment strategy of high‐resolution, previously inaccessible architectures are fabricated with ultrahigh precision, leading to an excellent spectra response from the fabricated metastructures. This method provides a new possibility to realize true 3D metamaterial fabrications featuring high‐resolution and direct‐compatibility with broad planar lithography platforms.