Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

Authors: Mohammad S.M. Saifullah, Anil Kumar Rajak, Kevin A. Hofhuis, Nikhil Tiwale, Zackaria Mahfoud, Andrea Testino, Prajith Karadan, Michaela Vockenhuber, Dimitrios Kazazis, Suresh Valiyaveettil, Yasin Ekinci

Published: 2024-08-20

DOI: 10.1021/acsnano.4c03939

Source: Full article

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