Formation of Highly Active NiO(OH) Thin Films from Electrochemically Deposited Ni(OH)<sub>2</sub> by a Simple Thermal Treatment at a Moderate Temperature: A Combined Electrochemical and Surface Science Investigation - KIVIRID

Formation of Highly Active NiO(OH) Thin Films from Electrochemically Deposited Ni(OH)<sub>2</sub> by a Simple Thermal Treatment at a Moderate Temperature: A Combined Electrochemical and Surface Science Investigation

Authors: Shasha Tao, Qingbo Wen, Wolfram Jaegermann, Bernhard Kaiser

Published: 2022-01-11

DOI: 10.1021/acscatal.1c04589

Source: Full article

Abstract

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